Growth of In nanocrystallite arrays on the Si(1 0 0)-c(4 × 12)–Al surface

Using scanning tunneling microscopy, growth of In nanoisland arrays on the Si(1 0 0)-c(4 × 12)–Al surface has been studied for In coverage up to 1.1 ML and substrate temperature from room temperature to 150 °C. In comparison to the case of In deposition onto the clean Si(1 0 0) surface or Si(1 0 0)4 × 3–In reconstruction, the In growth mode is changed by the c(4 × 12)–Al reconstruction from the 2D growth to 3D growth, thus displaying a vivid example of the Volmer–Weber growth mode. Possible crystal structure of the grown In nanoislands is discussed.