Title of article :
The molecular orientation of DNA bases on H-passivated Si(1 1 1) surfaces investigated by means of near edge X-ray absorption fine structure spectroscopy
Author/Authors :
Seifert، نويسنده , , Stefan and Gavrila، نويسنده , , Gianina N. and Zahn، نويسنده , , Dietrich R.T. and Braun، نويسنده , , Walter، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2007
Pages :
6
From page :
2291
To page :
2296
Abstract :
Layers of the DNA bases adenine, cytosine, and guanine were deposited onto hydrogen passivated Si(1 1 1) surfaces. The average tilt angles of these molecules with respect to the substrate surface were determined by the angular dependence of the Near Edge X-ray Absorption Fine Structure (NEXAFS) of the carbon K-edge. The interpretation of the NEXAFS spectra was assisted by a semi-empirical approach to the calculation of the π∗-transition region which employs density functional theory calculations and core level photoemission data.
Keywords :
DNA base , Cytosine , guanine , Molecular orientation , Near edge X-ray absorption fine structure spectroscopy , NEXAFS , Core level , photoemission spectroscopy , adenine
Journal title :
Surface Science
Serial Year :
2007
Journal title :
Surface Science
Record number :
1700793
Link To Document :
بازگشت