Title of article
In-plane and out-of-plane shape transitions of heteroepitaxially self-assembled nanostructures
Author/Authors
Goldfarb، نويسنده , , I.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2007
Pages
6
From page
2756
To page
2761
Abstract
In this work, shapes and shape transitions of several types of self-assembled heteroepitaxial nanostructures, as observed in in situ scanning tunneling microscopy experiments during growth, are examined in the framework of several equilibrium and kinetic models. In particular, heteroepitaxial TiSi2 and CoSi2 islands on Si(1 1 1) are shown to behave in accordance with generalized Wulff–Kaishew theorem of equilibrium strained and supported crystal shapes. More specifically, these silicide nanocrystals exhibit out-of-plane thickening shape transition by increasing their vertical aspect ratio with growth, as long as they are strained, and inverse (flattening) transition upon relaxation by misfit dislocations. On the other hand, heteroepitaxial Ge and CoSi2 islands on Si(0 0 1) are well-known for their in-plane anisotropic elongation. Plausible energetic and kinetic reasons for such elongation, based on the unique nucleation features of Ge–hut/Si(0 0 1) and non-planar CoSi2–hut/Si(0 0 1) interface, are discussed.
Keywords
surface structure , and topography , Roughness , Surface thermodynamics , Scanning tunneling microscopy , Germanium , Silicides , morphology , Self-assembled nanostructures , Vapor-phase epitaxy
Journal title
Surface Science
Serial Year
2007
Journal title
Surface Science
Record number
1701022
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