Electrodeposition of NiFe films on Si(1 0 0) substrate

Electroplating technique is especially interesting due to its low cost and high quality of deposits being extensively used in industry to deposit magnetic layers. In this work, NiFe films were electrodeposited on n-type Si(1 0 0) (1–7 Ohm cm) substrates using constant current mode. In the aim to determine the suitable conditions for obtaining the permalloy Ni80Fe20, baths with different chemical compositions were explored. The film composition and microstructure were examined by energy dispersive spectroscopy (EDS) and scanning electron microscopy (SEM). While structural properties of the samples were investigated by X-ray diffraction (XRD), the chemical composition (81%Ni 19%Fe) is obtained from the diluted bath containing NiSO4 + FeSO4 + H3BO3. Further additive compounds were added within the deposition bath in order to improve the film adhesion. The SEM micrographs for this sample show a uniform granular structure homogeneously distributed on the Si surface. The films have an fcc structure and grow with crystalline orientation of [1 1 1] and [2 0 0] in the direction of the film growth.