Title of article
Coverage-dependent chemisorption of Cl on Si(1 1 4)
Author/Authors
Butera، نويسنده , , R.E. and Agrawal، نويسنده , , Abhishek and Weaver، نويسنده , , J.H.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2008
Pages
6
From page
475
To page
480
Abstract
The dissociative chemisorption of Cl2 on Si(1 1 4) was studied at room temperature using scanning tunneling microscopy. Filled and empty state imaging revealed a multitude of possible adsorption configurations with adsorption preferring rebonded atom and dimer sites over tetramer sites. The dissociation and subsequent adsorption processes were sufficiently exothermic that Cl could interrogate the potential energy landscape and find local energy minima. Annealing revealed configurations that preserved the strongest π-bonds of the (1 1 4) reconstruction.
Keywords
1 , High-index single crystal surfaces , Vicinal single crystal surfaces , Chlorine , 4) , Halogens , Chemisorption , Scanning tunneling microscopy , Si(1
Journal title
Surface Science
Serial Year
2008
Journal title
Surface Science
Record number
1702728
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