• Title of article

    Charge exchange between low energy Si ions and Cs adatoms

  • Author/Authors

    Chen، نويسنده , , X. and Sroubek، نويسنده , , Z. and Yarmoff، نويسنده , , J.A.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2008
  • Pages
    10
  • From page
    620
  • To page
    629
  • Abstract
    Unexpectedly large yields of positive and negative ions are produced when 2 and 5 keV Si+ is singly scattered from Cs adatoms on Al(1 0 0) and Si(1 1 1). This is in contrast with Li+, in which case the ions are almost completely neutralized. The Si+ ions likely result from valence electron resonant charge transfer (RCT) enhanced by promotion of the ionization level as it interacts with the Cs 5p level, but incomplete resonance neutralization of the incoming Si+ cannot be absolutely excluded. The experimental data are quantitatively compared to the model and values of the microscopic parameters are estimated. Negative Si− ions are produced when the surface work function is very small, presumably by direct RCT to the projectile affinity level as it is bent downward by the image potential and by the dipole formed by the adsorbed Cs.
  • Keywords
    Metallic surfaces , Ion scattering spectroscopy , Ion–solid interactions , Low energy ion scattering (LEIS) , aluminum , Silicon , alkali metals , Adatoms
  • Journal title
    Surface Science
  • Serial Year
    2008
  • Journal title
    Surface Science
  • Record number

    1702787