Title of article :
Low-energy electron diffraction structure determination of an ultrathin CoO film on Ag(0 0 1)
Author/Authors :
Schindler، نويسنده , , K.-M. and Wang، نويسنده , , J. L. Chassé، نويسنده , , A. and Neddermeyer، نويسنده , , H. and Widdra، نويسنده , , W.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2009
Pages :
6
From page :
2658
To page :
2663
Abstract :
The atomic structure of a four layer thick film of CoO on a Ag(0 0 1) substrate has been determined by comparing experimental low-energy electron diffraction (LEED) I(V) curves with multiple scattering calculations. The CoO film has been prepared using reactive evaporation of Co in an oxygen atmosphere leading to almost layer-by-layer growth. Contrary to the surface of CoO crystals an outward relaxation of the two outermost CoO layers as well as rumpling in the top layer has been found. The supposed driving force of this relaxation is the in-plane compressive stress, which results from the pseudomorphic growth of the CoO film on the Ag(0 0 1) substrate and the lattice mismatch of the two materials.
Keywords :
Low-energy electron diffraction (LEED) , Metal-oxide interface , Cobalt oxide , Thin film structure
Journal title :
Surface Science
Serial Year :
2009
Journal title :
Surface Science
Record number :
1704916
Link To Document :
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