• Title of article

    A high pressure X-ray photoelectron spectroscopy study of oxidation and reduction of Rh(100) and Rh nanoparticles

  • Author/Authors

    Blomberg، نويسنده , , S. and Westerstrِm، نويسنده , , R. and Martin، نويسنده , , N.M. and Lundgren، نويسنده , , E. and Andersen، نويسنده , , J.N. and Messing، نويسنده , , M.E. and Gustafson، نويسنده , , J.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2014
  • Pages
    6
  • From page
    153
  • To page
    158
  • Abstract
    We have studied the oxidation and reduction of Rh(100) and SiO2 supported Rh particles using high pressure X-ray photoelectron spectroscopy. We show that the formation and reduction of Rh bulk oxide can be followed in situ in O2 and CO pressures in the range of 0.1 Torr. In general, the oxidation/reduction processes are similar on Rh(100) and the nanoparticles, but there are significant differences in temperature dependence. Already at a sample temperature of 140 °C, the particles show clear signs of a thin bulk oxide, while an ultra-thin so-called surface oxide covers the single crystal at the same temperature. Both of these oxide films, however, hinder further oxidation, and a thick oxide is only found at a temperature of at least 300 °C, for both samples. The reduction, in contrast, starts at a higher temperature on the particles as compared to the single crystal, but once started the particles are completely reduced at lower temperatures.
  • Keywords
    High pressure XPS , Rh(100) , Nanoparticles
  • Journal title
    Surface Science
  • Serial Year
    2014
  • Journal title
    Surface Science
  • Record number

    1706512