Title of article :
Atomic layer deposition of enantioselective thin film of alumina on chiral self-assembled-monolayer
Author/Authors :
Moshe ، نويسنده , , Hagay and Levi، نويسنده , , Gila and Sharon، نويسنده , , Daniel and Mastai، نويسنده , , Yitzhak، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2014
Pages :
6
From page :
88
To page :
93
Abstract :
In this paper, we describe the synthesis of new chiral nanosized surfaces based on chiral self-assembled monolayers coated with metal oxide (Al2O3) nanolayers. In this new type of nanosized chiral surface, the Al2O3 nanolayers enable the protection of the chiral self-assembled monolayers while preserving their enantioselective nature. The chiral nature of the SAMs/Al2O3 films was characterized by a variety of techniques, such as, quartz crystal microbalance, circular dichroism (CD) spectroscopy and chiral crystallization. The proposed methodology for the preparation of nanoscale chiral surfaces described in this article could open up opportunities in other fields of chemistry, such as chiral catalysis.
Keywords :
Chiral surfaces , Chiral self-assembled monolayers , Enantioselective crystallization , Al2O3
Journal title :
Surface Science
Serial Year :
2014
Journal title :
Surface Science
Record number :
1706527
Link To Document :
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