Author/Authors :
Lee، نويسنده , , Se-Hee and Cheong، نويسنده , , Hyeonsik M. and Park، نويسنده , , Nam-Gyu and Tracy، نويسنده , , C.Edwin and Mascarenhas، نويسنده , , Angelo and Benson، نويسنده , , David K. and Deb، نويسنده , , Satyen K. Deb، نويسنده ,
Abstract :
We report on a Raman spectroscopic study of sputtered nickel–tungsten oxide films. Their crystallographic and chemical identification with electrochemical lithium insertion and extraction are obtained by Raman spectroscopy. The Raman spectra of as-deposited Ni–W oxide films show a strong peak at 525 cm−1 due to vibrations of the NiO bonds and two weaker peaks at 875 and 950 cm−1, which we attribute to the vibrations of the WO bonds. The Raman spectrum of the as-deposited Ni–W oxide film shows a blueshift of the NiO stretching mode compared to that of a NiOx film. When lithium ions and electrons are inserted, the overall Raman intensity increases due to electrochromic bleaching and the relative intensity of the peak at 875 cm−1 also increases. By comparing these results with results from the same measurements using sodium ions, we conclude that this reversible peak at 875 cm−1 is not directly related to the Li or Na ions.