Title of article
Mechanically stable copolyimide for low level stress buffer
Author/Authors
Chung، نويسنده , , Hyunsoo and Lee، نويسنده , , Jongwhae and Hwang، نويسنده , , Jaewook and Han، نويسنده , , Haksoo Han، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
9
From page
7893
To page
7901
Abstract
Copolyimide thin films, which has the low level stress and stress relaxation induced by water sorption, were characterized for potential application as encapsulant, stress-relief buffer, and interlayer dielectrics. The polyimides studied are poly(p-phenylene pyromellitimide) (PMDA-PDA), poly(p-phenylene 4,4′-hexafluoroisopropylidene diphthalimide) (6FDA-PDA) and their random copolyimides with various composition. These copolyimide films exhibited good combinations of physical and mechanical properties with low thermal expansion coefficient (TEC) and residual stress behavior by appropriately selecting the ratios of the acid dianhydride component. For these copolyimides, residual stress increased in the range of −5 to 50 MPa, whereas stress relaxation induced by water uptake decreased in the range of 20.5–4.5 MPa at 30°C, 100% relative humidity with increasing 2,2′-bis(3,4-dicarboxyphenyl) hexafluoropropane dianhydride (6FDA) composition, respectively. The degree of in-plane chain orientation was directly correlated to the residual stress and stress relaxation coefficient (S) in the film, which is an in-plane characteristic. However, the stress relaxation caused by the water uptake was significantly influenced by packing order induced by chain mobility, which might occur during thermal imidization. Overall, the candidate for the low level stress buffer application from the PMDA/6FDA-PDA copolyimide was both the 90/10 (=PMDA/6FDA in molar ratio) and 70/30 copolyimides.
Keywords
Copolyimide , Residual stress , stress relaxation
Journal title
Polymer
Serial Year
2001
Journal title
Polymer
Record number
1715379
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