Title of article
Synthesis of polysilane–acrylamide copolymers by photopolymerization and their application to polysilane–silica hybrid thin films
Author/Authors
Matsuura، نويسنده , , Yukihito and Matsukawa، نويسنده , , Kimihiro and Kawabata، نويسنده , , Ryuichi and Higashi، نويسنده , , Nobuyuki and Niwa، نويسنده , , Masazo and Inoue، نويسنده , , Hiroshi، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2002
Pages
5
From page
1549
To page
1553
Abstract
Various polysilane–acrylamide block copolymers have been prepared from photopolymerization of acrylamide-type monomers using poly(methylphenylsilane) (PMPS) as a macro-photo-radical initiator. The acrylamide block in the copolymers improved the hydrophilic property of PMPS. These PMPS–acrylamide block copolymers have been applied to formation of PMPS–silica hybrid thin films via sol–gel reaction. Homogeneous and transparent PMPS–silica hybrid thin films were obtained from a few PMPS–acrylamide block copolymers. It was found for these hybrid thin films based on hydrogen bonding formation between amide group and silanol group. The surface properties of hybrid thin films were evaluated by water contact angle measurement, scanning electron microscope (SEM), and atomic force microscope (AFM) images.
Keywords
Polysilane , Polysilane–acrylamide block copolymer , Organic–inorganic hybrid thin film
Journal title
Polymer
Serial Year
2002
Journal title
Polymer
Record number
1716707
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