Title of article :
Synthesis of polysilane–acrylamide copolymers by photopolymerization and their application to polysilane–silica hybrid thin films
Author/Authors :
Matsuura، نويسنده , , Yukihito and Matsukawa، نويسنده , , Kimihiro and Kawabata، نويسنده , , Ryuichi and Higashi، نويسنده , , Nobuyuki and Niwa، نويسنده , , Masazo and Inoue، نويسنده , , Hiroshi، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2002
Pages :
5
From page :
1549
To page :
1553
Abstract :
Various polysilane–acrylamide block copolymers have been prepared from photopolymerization of acrylamide-type monomers using poly(methylphenylsilane) (PMPS) as a macro-photo-radical initiator. The acrylamide block in the copolymers improved the hydrophilic property of PMPS. These PMPS–acrylamide block copolymers have been applied to formation of PMPS–silica hybrid thin films via sol–gel reaction. Homogeneous and transparent PMPS–silica hybrid thin films were obtained from a few PMPS–acrylamide block copolymers. It was found for these hybrid thin films based on hydrogen bonding formation between amide group and silanol group. The surface properties of hybrid thin films were evaluated by water contact angle measurement, scanning electron microscope (SEM), and atomic force microscope (AFM) images.
Keywords :
Polysilane , Polysilane–acrylamide block copolymer , Organic–inorganic hybrid thin film
Journal title :
Polymer
Serial Year :
2002
Journal title :
Polymer
Record number :
1716707
Link To Document :
بازگشت