Title of article
Breaking polymer chains by dynamic plowing lithography
Author/Authors
Cappella، نويسنده , , B and Sturm، نويسنده , , H and Weidner، نويسنده , , S.M، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2002
Pages
6
From page
4461
To page
4466
Abstract
The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of force–displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films.
Keywords
AFM , nanolithography , chain scission
Journal title
Polymer
Serial Year
2002
Journal title
Polymer
Record number
1717903
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