Title of article
Influence of sputtering conditions on ionic conductivity of LiPON thin films
Author/Authors
Hamon، نويسنده , , Y. and Douard، نويسنده , , A. and Sabary، نويسنده , , F. and Marcel، نويسنده , , C. and Vinatier، نويسنده , , P. and Pecquenard، نويسنده , , B. and Levasseur، نويسنده , , A.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2006
Pages
5
From page
257
To page
261
Abstract
LiPON films were deposited using radio-frequency magnetron sputtering in a pure N2 gas atmosphere. The influence of rf power, N2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 °C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed.
Keywords
solid electrolyte , Thin films , ionic conductivity , Sputtering target density
Journal title
Solid State Ionics
Serial Year
2006
Journal title
Solid State Ionics
Record number
1718581
Link To Document