Title of article :
Diblock copolymer healing
Author/Authors :
Yufa، نويسنده , , Nataliya A. and Li، نويسنده , , Jason and Sibener، نويسنده , , S.J.، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Abstract :
The issue of self-healing materials is of paramount importance due to its intrinsic scientific value, as well as potential applications in a wide variety of fields, such as manufacturing, medicine, and electronics. We have investigated the behavior of poly(styrene-b-methylmethacrylate) diblock copolymer, following deformation performed by a silicon atomic force microscopy tip. We observed the changes in the polymer as it was subsequently heated in situ, and found how diblock “scars” can heal. These observations give important guidance to efforts that seek to create nanostructures using these methods, while also revealing fundamental insights into the mechanisms of polymer repair on the nanoscale.
Keywords :
Block copolymer , self-healing , AFM-based nanolithography