Title of article
Free volume behavior in spincast thin film of polystyrene by energy variable positron annihilation lifetime spectroscopy
Author/Authors
Ata، نويسنده , , S. and Muramatsu، نويسنده , , M. and Takeda، نويسنده , , J. and Ohdaira، نويسنده , , T. Uchikoshi T. S. Suzuki Y. Sakka، نويسنده , , R. and Ito، نويسنده , , K. and Kobayashi، نويسنده , , Y. and Ougizawa، نويسنده , , T.، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2009
Pages
4
From page
3343
To page
3346
Abstract
Free volume behavior in polystyrene thin films with thickness ranging from 22 to 1200 nm on silicon substrates was studied by energy variable positron annihilation lifetime spectroscopy (EVPALS). The films were prepared by spincasting from toluene solutions of 0.5–5.0 wt% polystyrene with Mw = 1 090 000 g/mol. Distinct deviations from bulk polystyrene in thermal expansion of the free volume holes and the glass transition temperature associated with free volume behavior were observed for the thinnest film with 22 nm thickness, indicating its exclusively high chain mobility. Comparison of the polystyrene concentration in the precursor solution around the overlap concentration suggests that the high chain mobility is due to less entangled chains caused by rapid removal of the solvent from the diluted solution in order to prepare very thin film.
Keywords
Polystyrene thin film , Positron annihilation lifetime spectroscopy , free volume
Journal title
Polymer
Serial Year
2009
Journal title
Polymer
Record number
1733014
Link To Document