Title of article :
Chemical prevention of light-induced degradation in amorphous silicon films
Author/Authors :
Kobayashi، نويسنده , , Hikaru and Kasama، نويسنده , , Yoshiko and Fujinaga، نويسنده , , Tetsushi and Takahashi، نويسنده , , Masao and Koinuma، نويسنده , , Hideomi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
4
From page :
151
To page :
154
Abstract :
The most serious problem for hydrogenated amorphous silicon (a-Si:H) solar cells is light induced-degradation due to the formation of defect states. A simple room temperature chemical method, i.e. the immersion of a-Si:H in crown-ether-containing KCN solutions under a positive bias, has been found to prevent light-induced deterioration of a-Si:H films. The prevention is attributed to the selective reaction of cyanide ions (CN−) with defect and defect precursor states. The inclusion of crown-ether completely prevents contamination of a-Si:H by K+ ions, and the applied positive bias enhances inward migration of CN− ions. The experimental results suggest that this chemical reaction is useful to block the light-induced degradation of a-Si:H solar cells and systems.
Keywords :
A. Thin films , D. Recombination and trapping , D. Photoconductivity and photovoltaics , A. Amorphous Si
Journal title :
Solid State Communications
Serial Year :
2002
Journal title :
Solid State Communications
Record number :
1762383
Link To Document :
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