Percolation study of defect tolerance in missing-crossbar networks

We present a percolation study of two-dimensional crossbar networks and investigate their defect tolerance to missing crossbars. We find that the rate at which connectivity degrades in such circuits is nearly constant up to a missing-crossbar fraction f of about 50%, for both site and bond percolation. On the other hand, for f>0.5 the rate of defect tolerance decreases very rapidly. This study provides a measure of the degree of reliability of crossbar networks presently envisioned for nanoelectronics, suggesting that this type of architecture is quite robust with respect to defect concentration.