Title of article :
Improved electrical properties of Pr-doped films
Author/Authors :
Wang، نويسنده , , Xiaofei and Lu، نويسنده , , Xiaomei and Weng، نويسنده , , Yuyan and Cai، نويسنده , , Wei and Wu، نويسنده , , Xiaobo and Liu، نويسنده , , Yunfei and Huang، نويسنده , , Fengzhen and Zhu، نويسنده , , Jinsong، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
4
From page :
267
To page :
270
Abstract :
Sr1−xPrxTiO3 films were prepared by metal organic deposition method on (111) Pt/Ti/SiO2/Si substrates. Pr-doping greatly improves the dc leakage behavior of the films. The samples with x = 0.075 show excellent electric field frequency and temperature stability of dielectric properties, while the x = 0.025 samples indicate an obvious dielectric relaxation behavior and better polarization versus applied electric field ( P – E ) hysteresis loops. These peculiar electrical properties can be explained mainly by the Pr-doping-induced changes in the free charge carriers, the lattice distortion, the charge transfer process and polar nanoregions. In addition, the variable valence of Pr ions may also have significant impacts.
Keywords :
D. Electric property , A. SrTiO3 film , D. Ferroelectricity
Journal title :
Solid State Communications
Serial Year :
2010
Journal title :
Solid State Communications
Record number :
1766390
Link To Document :
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