Title of article :
Electronic structure and optical properties of Nb doped Al2O3 on Si by atomic layer deposition
Author/Authors :
Xu، نويسنده , , Yan and Chen، نويسنده , , Lin and Sun، نويسنده , , Qing-Qing and Gu، نويسنده , , Jing-Jing and Lu، نويسنده , , Hong-Liang and Wang، نويسنده , , Peng-Fei and Ding، نويسنده , , Shijin and Zhang، نويسنده , , David Wei، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
3
From page :
1690
To page :
1692
Abstract :
Nb2O5 and Nb doped Al2O3 have proved to be good candidates as resistive switch materials or optical materials. In this letter, we focus on the complex electronic structure and optical properties of Nb doped Al2O3 to give chemical physical images of the films. With the help of SE, XPS and XPS valence band spectra, the detailed electronic structure with atomic bonding structure and optical properties are given. The band gap of a thin oxide film is determined to be 5.05 eV, and the evolution of VBO and CBO of the film on Si are also discussed.
Keywords :
C. Optical properties , D. Electronic structure , A. Nb2O5 and Al2O3 , B. Atomic layer deposition
Journal title :
Solid State Communications
Serial Year :
2010
Journal title :
Solid State Communications
Record number :
1767149
Link To Document :
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