Title of article :
Series expansion and computer simulation studies of random sequential adsorption
Author/Authors :
Wang، نويسنده , , Jian-Sheng، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
We discuss two important techniques; series expansion and Monte Carlo simulation, for a random sequential adsorption study. Random sequential adsorption is an idealization for surface deposition where the time scale of particle relaxation is much longer than the time scale of deposition. Particles are represented as extended objects which are adsorbed onto a continuum surface or lattice sites. Once landed on the surface, the particles stick to the surface. We review in some detail, various methods of computing the coverage θ(t) and present some of the recent and new results in random sequential adsorption.
Keywords :
Random sequential adsorption , Lattice site , Particle relaxation , Deposition
Journal title :
Colloids and Surfaces A Physicochemical and Engineering Aspects
Journal title :
Colloids and Surfaces A Physicochemical and Engineering Aspects