Title of article :
Ion chemistry in tetramethylsilane (CH3)4Si
Author/Authors :
McGinnis، نويسنده , , S. and Riehl، نويسنده , , K. and Haaland، نويسنده , , P.D.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1995
Pages :
4
From page :
99
To page :
102
Abstract :
The cross sections for simple and dissociative ionization of tetramethylsilane ((CH3)4Si or TMS) by electron impact have been measured using Fourier-transform mass spectrometry. The total ionization cross section is 8.5 x 10−16 cm2 between 30 and 70 eV. The molecular ion is Jahn-Teller unstable, with dissociative ionization to form (CH3)3Si+ dominating the mass spectrum. CH3SiH2+ and CH3Si+ react rapidly with TMS to produce (CH3)3Si+. (CH3)3Si+ does not react with TMS but is slowly hydrated by background water vapor.
Journal title :
Chemical Physics Letters
Serial Year :
1995
Journal title :
Chemical Physics Letters
Record number :
1772459
Link To Document :
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