Title of article
On the chaperon mechanism for association rate constants: the formation of HO2 and O3
Author/Authors
Varandas، نويسنده , , A.J.C. and Pais، نويسنده , , A.A.C.C. and Marques، نويسنده , , J.M.C. and Wang، نويسنده , , W.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
8
From page
264
To page
271
Abstract
We report rate constants for the formation of HO2 and O3 using the chaperon mechanism, and with Ar as scattering partner. The ArHO2 and ArO3 potential energy surfaces have been written as a pairwise summation of realistic EHFACE2-type potentials for interactions involving Ar and reliable global DMBE potential surfaces for chemically stable triatomic species. The calculations have been carried out using the quasiclassical trajectory approach.
Journal title
Chemical Physics Letters
Serial Year
1996
Journal title
Chemical Physics Letters
Record number
1775922
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