Author/Authors :
Wee، نويسنده , , A.T.S. and Fishlock، نويسنده , , T.W. and Dixon، نويسنده , , R.A. and Foord، نويسنده , , J.S. and Egdell، نويسنده , , R.G and Pethica، نويسنده , , J.B.، نويسنده ,
Abstract :
The etching of Cu(210) by bromine has been investigated using scanning tunneling microscopy. Cu(210) etches at lower temperatures compared to low-index Cu planes resulting in a series of superstructures and stepped planes. In particular, a two-dimensional mesoscopic triangular checkerboard pattern formed by Br etching at low temperatures (600–700 K) is reported for the first time, opening up a myriad of possible applications in nano-device fabrication.
