• Title of article

    Study on the crystallization behavior of amorphous carbon nitride films

  • Author/Authors

    Xiao، نويسنده , , Xing-cheng and Jiang، نويسنده , , Wei-hui and Song، نويسنده , , Li-xin and Tian، نويسنده , , Jing-fen and Hu، نويسنده , , Xing-fang، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    5
  • From page
    240
  • To page
    244
  • Abstract
    Amorphous carbon nitride films were first prepared by DC reactive magnetron sputtering, followed by heat treatment under protective nitrogen. The ensuing thermal effects were analyzed by DTA-TG, XRD and XPS. The results showed that heat treatment above 1100°C could induce the transition from an amorphous to a crystalline state of carbon nitride films. Apparent diffraction peaks of α-C3N4 appeared in the XRD spectra of samples heat-treated at 1180°C. XPS results further supported the analysis of crystallization of the films after heat treatment.
  • Journal title
    Chemical Physics Letters
  • Serial Year
    1999
  • Journal title
    Chemical Physics Letters
  • Record number

    1779178