Title of article
Study on the crystallization behavior of amorphous carbon nitride films
Author/Authors
Xiao، نويسنده , , Xing-cheng and Jiang، نويسنده , , Wei-hui and Song، نويسنده , , Li-xin and Tian، نويسنده , , Jing-fen and Hu، نويسنده , , Xing-fang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
5
From page
240
To page
244
Abstract
Amorphous carbon nitride films were first prepared by DC reactive magnetron sputtering, followed by heat treatment under protective nitrogen. The ensuing thermal effects were analyzed by DTA-TG, XRD and XPS. The results showed that heat treatment above 1100°C could induce the transition from an amorphous to a crystalline state of carbon nitride films. Apparent diffraction peaks of α-C3N4 appeared in the XRD spectra of samples heat-treated at 1180°C. XPS results further supported the analysis of crystallization of the films after heat treatment.
Journal title
Chemical Physics Letters
Serial Year
1999
Journal title
Chemical Physics Letters
Record number
1779178
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