Title of article :
Ab initio study of the intermolecular potential surface of He–NH3
Author/Authors :
Li، نويسنده , , Zhiru and Chou، نويسنده , , Arthur and Tao، نويسنده , , Fu-Ming، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
8
From page :
313
To page :
320
Abstract :
The intermolecular potential surface for the van der Waals complex He–NH3 is studied by ab initio calculation using fourth-order Møller–Plesset perturbation theory (MP4) with a bond function basis set. The calculation gives a global minimum at R=3.26 Å, θ=89°, φ=60° (in a Jacobi coordinate system) with a well depth of De=32.96 cm−1, along with barriers of 23.09 and 20.86 cm−1 for in-plane rotations at θ=0° and 180°, respectively, and a barrier of 10.45 cm−1 for out-of-plane rotation at θ=89°, φ=0°. The potential energy surface of He–NH3 is compared to those of Ar–NH3 and He–H2O, respectively.
Journal title :
Chemical Physics Letters
Serial Year :
1999
Journal title :
Chemical Physics Letters
Record number :
1779922
Link To Document :
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