Author/Authors :
Hrbek، نويسنده , , J. and Li، نويسنده , , S.Y. and Rodriguez، نويسنده , , J.A. and van Campen، نويسنده , , D.G. and Huang، نويسنده , , H.H. and Xu، نويسنده , , G.-Q.، نويسنده ,
Abstract :
Thin films of molecular sulfur were prepared by the deposition of S2 gas from an electrochemical closer on single crystal metal surfaces kept at temperatures below 250 K. These films were characterized by XPS, UPS, TDS and IRAS, and were found to be stable up to 390 K even under UHV conditions. Cyclooctasulfur S8 was identified as one of the sulfur molecules present.