Author/Authors :
Ikejiri، نويسنده , , K and Ohoyama، نويسنده , , H and Nagamachi، نويسنده , , Y and Teramoto، نويسنده , , T and Kasai، نويسنده , , T، نويسنده ,
Abstract :
A high intensity pulsed DC discharge source for OH radical beam was developed by the systematic optimization for geometry of the discharge source and for the operation conditions. OH radicals produced in the DC discharge source were state-selected by an electrostatic hexapole field. The maximum OH flux in the lowest |J,Ω,M〉=|3/2,3/2,3/2〉 state was directly measured to be 8.5 × 1014 radicals cm−2 s−1 at the beam crossing point of 150 cm downstream from nozzle by a saturated laser-induced fluorescence spectroscopy for the Q1(1) transition in A2Σ←X2Π3/2 transition.
