Surface modification of TiO2 film by iron doping using reactive magnetron sputtering

Fe-doped TiO2 films are prepared by pulse dc reactive magnetron sputtering. Iron concentration is controlled by varying the surface area of Fe pieces fixed on the pure titanium target. TiO2 films are in anatase phase when iron concentration is less than 10 at.%. Only Ti(IV) is found in the pure TiO2 film while Fe-doped TiO2 films show mixed titanium oxidation states. The absorption edges of Fe-doped TiO2 films show red shift. The films with low iron concentrations perform better photocatalytic activity than the pure TiO2 film and the best doped iron concentration is 0.58 at.%.