Title of article
Short-circuiting in fullerene devices studied by in situ electrical measurement in high vacuum and infrared imaging analysis
Author/Authors
Wu، نويسنده , , H.R. and Wang، نويسنده , , M.L. and Song، نويسنده , , Q.L. and Wu، نويسنده , , Y. and Xie، نويسنده , , Z.T. and Gao، نويسنده , , X.D. and Ding، نويسنده , , X.M. and Hou، نويسنده , , X.Y.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2007
Pages
5
From page
231
To page
235
Abstract
In the present work, current–voltage (I–V) characteristics of fullerene devices (ITO⧹C60⧹Al) are reexamined by in situ electrical measurement in high vacuum and by infrared imaging analysis. Two kinds of I–V curves are detected: ‘ohmic’ and nonohmic. Degradation processes of the two different devices are measured, and ‘ohmic’ degradation processes are ascribed to short-circuiting. ITO⧹C60⧹Al devices in high vacuum are confirmed to be intrinsically nonohmic. Surface temperature distribution of the two different devices is measured and localized heat is detected further confirming the existence of short-circuiting in ‘ohmic’ devices. To avoid short-circuit, organic buffers are inserted between fullerene layer and cathode and this is found to be effective.
Keywords
Fullerene , Infrascope image , Short-circuiting , In situ high vacuum measurement
Journal title
Current Applied Physics
Serial Year
2007
Journal title
Current Applied Physics
Record number
1785835
Link To Document