Title of article :
Characterization of Young’s modulus of silicon versus temperature using a “beam deflection” method with a four-point bending fixture
Author/Authors :
Cho، نويسنده , , Chun-Hyung، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2009
Pages :
8
From page :
538
To page :
545
Abstract :
Young’s modulus (E) and Poisson’s ratio (ν) are dependent upon the direction on the silicon surface. In this work, E and ν of silicon have been calculated analytically for any crystallographic direction of silicon by using compliance coefficients (s11, s12, and s44), and the values of E are confirmed experimentally by using a “beam deflection” method with a four-point bending fixture. Experimental results for E as a function of temperature from −150 °C to +150 °C are presented for (0 0 1) and (1 1 1) silicon wafers.
Keywords :
4PB , Young’s modulus (elastic modulus) , Poisson’s ratio , Beam deflection
Journal title :
Current Applied Physics
Serial Year :
2009
Journal title :
Current Applied Physics
Record number :
1786693
Link To Document :
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