Title of article
Complete wetting characteristics of micro/nano dual-scale surface by plasma etching to give nanohoneycomb structure
Author/Authors
Kim، نويسنده , , Dongseob and Lee، نويسنده , , Sangmin and Hwang، نويسنده , , Woonbong، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2012
Pages
6
From page
219
To page
224
Abstract
A variety of flat superhydrophilic surfaces have been fabricated for biological and industrial applications. We report here the preparation of a simple and inexpensive non-polar curved superhydrophilic surface. This surface has dual-scale surface roughness, on both micro- and nanoscales. Curved surfaces with a near-zero water contact angle and ‘complete wetting’ are demonstrated. By using a conventional plasma etching process, which creates microscale irregularity on an aluminum surface, followed by an anodization process which further modifies the plasma etched surface by creating nanoscale structures, we generate a surface having irregularities on two-scales. This surface displays a semi-permanent superhydrophilic property (if the surface has no damage by the exterior failure), having a near-zero contact angle with water drops. We further report a simple and inexpensive curved (i.e., non-planar) superhydrophilic structure with a near-zero contact angle. The dual-scale character of the surface increases the capillary force effect and reduces the energy barriers of the nanostructures.
Keywords
Superhydrophilic surface , nanohoneycomb , Dual-scale , Plasma etch , Anodization
Journal title
Current Applied Physics
Serial Year
2012
Journal title
Current Applied Physics
Record number
1788787
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