Title of article :
Specific immobilization of nanospheres on template fabricated by using atomic force microscope lithography
Author/Authors :
Park، نويسنده , , Jinyoung and Lee، نويسنده , , Haiwon، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
3
From page :
133
To page :
135
Abstract :
The atomic force microscope (AFM) lithography was locally applied to the methyl group-modified substrate and selective immobilization of polystyrene (PS) nanospheres onto an anchored self-assembled monolayer was successfully carried out. In order to immobilize PS nanospheres on the rigid surface selectively, the patterned area was further modified with amine group by self-assembly process. The PS nanospheres modified with carboxylic acid group were selectively immobilized by the covalent bond onto the amine-modified area. The immobilized polystyrene nanospheres were characterized by a tapping mode AFM and ellipsometry.
Keywords :
Selective immobilization , Nanosphere , AFM lithography , Covalent bond
Journal title :
Colloids and Surfaces A Physicochemical and Engineering Aspects
Serial Year :
2005
Journal title :
Colloids and Surfaces A Physicochemical and Engineering Aspects
Record number :
1789507
Link To Document :
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