Title of article :
The g-values of defects in hydrogenated microcrystalline silicon
Author/Authors :
Morigaki، نويسنده , , K. and Niikura، نويسنده , , C.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
308
To page :
312
Abstract :
The anisotropic g-values of defects in hydrogenated microcrystalline silicon prepared by hot-wire chemical vapour deposition have been measured as a function of crystalline volume fraction at room temperature. The defect has been identified as a silicon-dangling bond existing on the surface of crystalline grain. Their anisotropic g-values are discussed in the light of theoretical calculations by Ishii et al. and Ishii and Shimizu. The defect density is also discussed as a function of crystalline volume fraction.
Keywords :
A. Microcrystalline semiconductors , C. Point defects , E. Electron paramagnetic resonance , A. Thin films
Journal title :
Solid State Communications
Serial Year :
2005
Journal title :
Solid State Communications
Record number :
1790298
Link To Document :
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