Title of article :
Ion implantation inducing nanovoids characterized by TEM and STEM
Author/Authors :
Xiao، نويسنده , , Xiangheng and Jiang، نويسنده , , Changzhong and Ren، نويسنده , , Feng and Wang، نويسنده , , Jianbo and Shi، نويسنده , , Ying، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
4
From page :
362
To page :
365
Abstract :
The evolution of nanoparticles in sequentially ion-implanted Ag and Ag/Cu into silica glasses has been studied. The doses for implantation (×1016 ions/cm2) were 5Ag, 5Ag/5Cu and 5Ag/15Cu. Ag nanoclusters have been formed in the implanted 5Ag specimen. In the implanted 5Ag/5Cu specimen, some formed nanoclusters have brighter center features. With an increase of Cu ions dose, the nanoclusters with brighter center features become prevalent. The microstructural properties of the nanoparticles are characterized by transmission electron microscopy. Scanning transmission electron microscope high-angle annular dark field and high-resolution transmission electron microscopy are also utilized to study the formed nanoparticles. The results show that nanovoids have been induced into metal nanoparticles during the ion implanting process, not the core-shell nanoparticles as other workers believed. The nanovoids can be the aggregation of vacancies induced by irradiation.
Keywords :
A. Nanoparticles , A. Nanovoids , D. Ion implantation
Journal title :
Solid State Communications
Serial Year :
2006
Journal title :
Solid State Communications
Record number :
1790477
Link To Document :
بازگشت