Title of article :
High pressure and high temperature in situ X-ray diffraction study on the structural stability of tantalum disilicide
Author/Authors :
Li، نويسنده , , C.Y. and Yu، نويسنده , , Z.H. and Liu، نويسنده , , H.Z. and Lu، نويسنده , , T.Q.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Abstract :
The structural stability in TaSi2 was investigated by in situ angle dispersive X-ray diffraction (AD-XRD), which shows that the structure is stable even up to about 50.0 GPa at room temperature. However, under high pressure and high temperature (HPHT) conditions it was revealed that TaSi2 could undergo a structural phase transition from a C40-type hexagonal phase to a metastable phase after a temperature quench from 573 K at 10.6 GPa.
Keywords :
A. Intermetallic compounds , C. Crystal structure and symmetry , D. Phase transitions , E. High temperature and high pressure
Journal title :
Solid State Communications
Journal title :
Solid State Communications
