Title of article
Deposition and properties of a-C:H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method
Author/Authors
Zhou، نويسنده , , X.T. and Lee، نويسنده , , S.T. and Bello، نويسنده , , I. and Cheung، نويسنده , , A.C. and Chiu، نويسنده , , D.S. and Lam، نويسنده , , Y.W. and Lee، نويسنده , , C.S. and Leung، نويسنده , , K.M. and He، نويسنده , , X.M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
273
To page
277
Abstract
a-C:H films were deposited on polymethyl methacrylate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition of CH4 diluted in Ar gas. The effect of substrate on the deposition process, optical properties and structure of the a-C:H films was studied. A transparent polymer-like carbon film formed on PMMA, while a semi-transparent diamond-like carbon (DLC) formed on silicon under the same growth conditions. The a-C:H films grown under certain conditions were found to substantially improve the wear resistance of PMMA substrates.
Keywords
Electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) , PMMA , a-C:H films
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1798375
Link To Document