Author/Authors :
Zhou، نويسنده , , X.T. and Lee، نويسنده , , S.T. and Bello، نويسنده , , I. and Cheung، نويسنده , , A.C. and Chiu، نويسنده , , D.S. and Lam، نويسنده , , Y.W. and Lee، نويسنده , , C.S. and Leung، نويسنده , , K.M. and He، نويسنده , , X.M.، نويسنده ,
Abstract :
a-C:H films were deposited on polymethyl methacrylate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition of CH4 diluted in Ar gas. The effect of substrate on the deposition process, optical properties and structure of the a-C:H films was studied. A transparent polymer-like carbon film formed on PMMA, while a semi-transparent diamond-like carbon (DLC) formed on silicon under the same growth conditions. The a-C:H films grown under certain conditions were found to substantially improve the wear resistance of PMMA substrates.
Keywords :
Electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) , PMMA , a-C:H films
