Title of article
Pre-treatment of large area strips with the aid of a high power Hall current accelerator
Author/Authors
Vershinin، نويسنده , , N. and Dimitriou، نويسنده , , R. and Benmalek، نويسنده , , M. and Straumal، نويسنده , , B. and Gust، نويسنده , , W. and Vivas، نويسنده , , J. and Shulga، نويسنده , , J.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
35
To page
39
Abstract
A large aperture Hall current accelerator has been developed for ionic cleaning of glass and metallic strips before vacuum arc deposition of protective and decorative layers. The accelerator has a large aperture of 1400 mm and power up to 10 kW. Various gases can be used for sputter cleaning: argon, nitrogen, oxygen, etc. The advantages of the Hall current source towards that of Kaufman in industrial processes are emphasized. The source sputter rates were measured. The maximal sputter rate is 7.5 nm/min for glass and 100 nm/min for poly(methyl metacrylate). The quality of ionic etching was demonstrated with the aid of Auger electron spectroscopy. The current–voltage characteristics for argon and oxygen are presented.
Keywords
Ionic etching , Kaufman source , Sputter cleaning , Hall current accelerator
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1798550
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