Title of article :
Near-edge X-ray absorption fine structure study of carbon nitride films
Author/Authors :
Lenardi، نويسنده , , C. and Baker، نويسنده , , M.A. and Briois، نويسنده , , V. and Coccia Lecis، نويسنده , , G. and Piseri، نويسنده , , P. and Gissler، نويسنده , , W.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
5
From page :
317
To page :
321
Abstract :
Near-edge X-ray absorption fine structure (NEXAFS) measurements have been made on carbon nitride films containing as much as 44 at.% of nitrogen. The films have been synthesized by dual ion beam deposition (IBD) bombarding a carbon target with low-energy nitrogen ions at varying nitrogen beam energies and substrate temperatures ranging from the liquid nitrogen temperature up to 400°C. The structural changes induced by the reduction of the temperature have been previously investigated [Hammer et al., J. Vac. Sci. Technol. A 15 (1) (1997) 107; Baker et al., Surf. Coat. Technol. 97 (1997) 544]. The transition from a predominantly sp2/sp3 CN amorphous arrangement to a more polymer-like structure has been confirmed and more deeply examined by X-ray absorption spectroscopy. In particular, for samples deposited at liquid nitrogen temperature, a relevant reduction of sp2 CC fraction has been detected. Moreover, the condensation on the growing film surface of hydrogen containing species (i.e. HCN) has been well identified by the appearance of the CH∗ peak.
Keywords :
Carbon nitride , Dual ion beam deposition , Near-edge X-ray absorption fine structure
Journal title :
Surface and Coatings Technology
Serial Year :
2000
Journal title :
Surface and Coatings Technology
Record number :
1798749
Link To Document :
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