Title of article
Near-edge X-ray absorption fine structure study of carbon nitride films
Author/Authors
Lenardi، نويسنده , , C. and Baker، نويسنده , , M.A. and Briois، نويسنده , , V. and Coccia Lecis، نويسنده , , G. and Piseri، نويسنده , , P. and Gissler، نويسنده , , W.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
317
To page
321
Abstract
Near-edge X-ray absorption fine structure (NEXAFS) measurements have been made on carbon nitride films containing as much as 44 at.% of nitrogen. The films have been synthesized by dual ion beam deposition (IBD) bombarding a carbon target with low-energy nitrogen ions at varying nitrogen beam energies and substrate temperatures ranging from the liquid nitrogen temperature up to 400°C. The structural changes induced by the reduction of the temperature have been previously investigated [Hammer et al., J. Vac. Sci. Technol. A 15 (1) (1997) 107; Baker et al., Surf. Coat. Technol. 97 (1997) 544]. The transition from a predominantly sp2/sp3 CN amorphous arrangement to a more polymer-like structure has been confirmed and more deeply examined by X-ray absorption spectroscopy. In particular, for samples deposited at liquid nitrogen temperature, a relevant reduction of sp2 CC fraction has been detected. Moreover, the condensation on the growing film surface of hydrogen containing species (i.e. HCN) has been well identified by the appearance of the CH∗ peak.
Keywords
Carbon nitride , Dual ion beam deposition , Near-edge X-ray absorption fine structure
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1798749
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