• Title of article

    Near-edge X-ray absorption fine structure study of carbon nitride films

  • Author/Authors

    Lenardi، نويسنده , , C. and Baker، نويسنده , , M.A. and Briois، نويسنده , , V. and Coccia Lecis، نويسنده , , G. and Piseri، نويسنده , , P. and Gissler، نويسنده , , W.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    317
  • To page
    321
  • Abstract
    Near-edge X-ray absorption fine structure (NEXAFS) measurements have been made on carbon nitride films containing as much as 44 at.% of nitrogen. The films have been synthesized by dual ion beam deposition (IBD) bombarding a carbon target with low-energy nitrogen ions at varying nitrogen beam energies and substrate temperatures ranging from the liquid nitrogen temperature up to 400°C. The structural changes induced by the reduction of the temperature have been previously investigated [Hammer et al., J. Vac. Sci. Technol. A 15 (1) (1997) 107; Baker et al., Surf. Coat. Technol. 97 (1997) 544]. The transition from a predominantly sp2/sp3 CN amorphous arrangement to a more polymer-like structure has been confirmed and more deeply examined by X-ray absorption spectroscopy. In particular, for samples deposited at liquid nitrogen temperature, a relevant reduction of sp2 CC fraction has been detected. Moreover, the condensation on the growing film surface of hydrogen containing species (i.e. HCN) has been well identified by the appearance of the CH∗ peak.
  • Keywords
    Carbon nitride , Dual ion beam deposition , Near-edge X-ray absorption fine structure
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1798749