Title of article
Investigation of low-energy carbon cluster depositions on surfaces by a molecular dynamics simulation
Author/Authors
Pan، نويسنده , , Zhengying and Zhu، نويسنده , , Wenjun and Man، نويسنده , , Zhenyong and Xu، نويسنده , , Yi and Ho، نويسنده , , Yukun، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
76
To page
80
Abstract
The dynamic behavior of C20 adsorption on a silicon (001)-(2×1) surface, and C28 adsorption on a diamond (001)-(2×1) surface were investigated by a molecular dynamics simulation. The impact energies of clusters ranged from 0.2 to 5 eV/atom. After impacting, the fullerenes were found to move collectively in the plane, perpendicular to the incident direction. The lateral motion of clusters is dependent on its impact energy, the anisotropic structure of the cluster, and the surface. By the end of the simulation (∼3 ps), they reside either on the top of a dimer or in the trough of the reconstructed surface, which are energy-favored sites. It has been found that in a certain energy range, the adsorbed fullerenes can retain their original free cluster structure.
Keywords
Cluster , chemical vapor deposition , Silicon , carbon
Journal title
Surface and Coatings Technology
Serial Year
2000
Journal title
Surface and Coatings Technology
Record number
1799162
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