• Title of article

    Investigation of low-energy carbon cluster depositions on surfaces by a molecular dynamics simulation

  • Author/Authors

    Pan، نويسنده , , Zhengying and Zhu، نويسنده , , Wenjun and Man، نويسنده , , Zhenyong and Xu، نويسنده , , Yi and Ho، نويسنده , , Yukun، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    76
  • To page
    80
  • Abstract
    The dynamic behavior of C20 adsorption on a silicon (001)-(2×1) surface, and C28 adsorption on a diamond (001)-(2×1) surface were investigated by a molecular dynamics simulation. The impact energies of clusters ranged from 0.2 to 5 eV/atom. After impacting, the fullerenes were found to move collectively in the plane, perpendicular to the incident direction. The lateral motion of clusters is dependent on its impact energy, the anisotropic structure of the cluster, and the surface. By the end of the simulation (∼3 ps), they reside either on the top of a dimer or in the trough of the reconstructed surface, which are energy-favored sites. It has been found that in a certain energy range, the adsorbed fullerenes can retain their original free cluster structure.
  • Keywords
    Cluster , chemical vapor deposition , Silicon , carbon
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2000
  • Journal title
    Surface and Coatings Technology
  • Record number

    1799162