In-situ TEM observation of silver nanocrystals in an Ag-implanted SiO2 film

The Ag ions were implanted in an amorphous SiO2 film, which was placed in a sample chamber of TEM. The concentration and size distribution of the Ag nanocrystals as functions of both the ion dose and the annealing temperature were examined in-situ by using this TEM. The selected diffraction pattern determined the Ag nanocrystal’s presence and the dark field micrograph showed the shape and the concentration of the Ag nanocrystals. The implantation results demonstrated an average size diminution and a significant concentration increase of the Ag nanocrystals when the dose increased. The annealing results showed a loss of silver at 300°C and above.