Development of hybrid pulse plasma coating system

A new plasma coating system is developed, which incorporates plasma-based ion implantation (PBII) with pulse-gas introduction, as well as pulse-plasma generation. This system operates by combining plasma chemical vapor deposition (plasma CVD) with ion beam mixing. For to create a deposited layer with a uniform thickness, both gas introduction and plasma generation are performed in pulses. Gas is introduced into the chamber while the plasma is extinguished. Then a negative high voltage is supplied to the workpiece to perform atomic mixing by PBII. In this system a microwave-plasma source, which completely eliminates static magnetic field, is adopted. The plasma is ignited with the help of inductively coupled RF power of 13.56 MHz, and the density is then increased by absorption of 2.45 GHz of microwave power. In this paper, the principle of the new hybrid pulse-plasma coating system and some of the fundamental performances are described.