Development of plasma-based ion implantation (PBII) techniques at Osaka National Research Institute (ONRI)

The plasma-based ion implantation (PBII) method has been combined with the pulsed cathodic arc plasma source to make a processing system suitable for surface modification of materials, such as metals, plastics and ceramics. By controlling the arc plasma pulse and the target pulse, the surface modification can be changed from plasma deposition to ion implantation. Various versions of applying the negative bias high-voltage pulse are described and compared with other methods. Concentration profiles of aluminum ion-implantation on the surfaces of a complex-shaped trench are discussed and the future applications in our institute are introduced.