• Title of article

    Inverter plasma discharge system

  • Author/Authors

    Sugimoto، نويسنده , , Satoshi and Kiuchi، نويسنده , , Masato and Takechi، نويسنده , , Seiji and Tanaka، نويسنده , , Katsutoshi and Goto، نويسنده , , Seiichi، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    4
  • From page
    65
  • To page
    68
  • Abstract
    We have developed a bipolar pulsed dc glow plasma discharge system using an inverter power supply. A target of the developed system is a low-cost surface modification operated in a low background pressure region (101–103 Pa) obtained with rotary pumps. In this pressure region, breakdown voltages for most gases have minimum values without the help of magnetic fields like a magnetron. Accordingly, we can use simple discharge electrodes such as parallel plates that would be extended for large area processing. These electrodes are driven by the bipolar voltage pulses including dc bias components which would drive both positive ions and electrons. A composition of the developed discharge system is shown. Voltage and current waveforms and emission light signals are measured to demonstrate a discharge operation. Initial applications of the developed system using a bipolar pulse processing technique are proposed.
  • Keywords
    Surface treatment , sputtering , dc glow discharge system , Pulsed plasma , Inverter power supply , Processing plasma
  • Journal title
    Surface and Coatings Technology
  • Serial Year
    2001
  • Journal title
    Surface and Coatings Technology
  • Record number

    1800610