Ion current analysis in pulsed RF plasma as a fundamental research of plasma-based ion implantation

Analysis of the target current in plasma-based ion implantation (PBII) has been performed using a simple equivalent circuit model. It was found that a current for charging the stray capacitance dominates the initial phase of the voltage pulse. The target voltage decay after turning off the power supply depends on the sheath impedance and the stray capacitance as well. It is therefore very important to reduce the stray capacitance in order to suppress unfavorable effects, such as sputtering with low energy ions.