Monitoring of ion mass composition in plasma immersion ion implantation

A system to monitor the ion mass and charge state as well as plasma potential value during plasma immersion ion implantation and deposition (PI3D) has been developed. It was tested with a 30-kV PI3D setup using hot cathode DC (HC) and inductively coupled RF (ICP) discharge sources alternatively. The ion mass analyzer has a moderate resolution at approximately 30, provides ion sampling from different points within the plasma volume, and is adaptable to various plasma devices. The design and performance of the system will be described, and experimental results in nitrogen and argon plasmas produced by the modular HC-ICP source will be discussed.