Title of article
Interface analysis of amorphous silicon solar cell structures
Author/Authors
Gutiérrez، نويسنده , , M.T. and Maffiotte، نويسنده , , C.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
6
From page
175
To page
180
Abstract
Interface properties of amorphous-silicon solar cells have been studied using X-ray photoelectron spectroscopy. The cells used have microcrystalline p- and n-type emitters, and the transparent conductive oxide is commercial SnO2. Compositional information relative to depth has been obtained applying the technique in combination with sputtering for a variable amount of time. I–V characteristics and spectral responses have been interpreted on the basis of the results of the chemical analysis. Certain efficiency-limiting mechanisms have been identified, such as SnO2 chemical reduction by plasma-enhanced chemical vapour deposition (PE-CVD) and aluminium diffusion into the amorphous silicon.
Keywords
amorphous silicon , Photovoltaic devices , chemical vapour deposition , Photoelectron spectroscopy
Journal title
Surface and Coatings Technology
Serial Year
2001
Journal title
Surface and Coatings Technology
Record number
1800820
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