Nanoindentation studies on amorphous carbon nitride thin films prepared by shielded arc ion plating

Three types of amorphous carbon-based thin films, a-C:N, a-C:Ar and a-C:N:Ar thin films, were prepared by shielded arc ion plating (SAIP) at various substrate bias voltages. SAIP uses a shielding plate set between target and substrate, which traps macroparticles flowing from the target and avoids their deposition on the substrate. This simple shielding method results in smooth surfaces of the deposited films. Nanohardness and nano-wear-resistance of these synthesized films were measured with a nanoindentation system. The a-C:Ar films were the hardest, possessing maximum hardness of 35 GPa. The a-C:N films and a-C:N:Ar films showed excellent wear resistance.