Title of article :
Characterization of TiNi shape-memory alloy thin films for MEMS applications
Author/Authors :
Fu، نويسنده , , Yongqing and Huang، نويسنده , , Weimin and Du، نويسنده , , Hejun and Huang، نويسنده , , Xu and Tan، نويسنده , , Junping and Gao، نويسنده , , Xiangyang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
6
From page :
107
To page :
112
Abstract :
Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior.
Keywords :
shape-memory , sputtering , Thin films , MEMS , TiNi
Journal title :
Surface and Coatings Technology
Serial Year :
2001
Journal title :
Surface and Coatings Technology
Record number :
1802542
Link To Document :
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