Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane

ArF laser-induced polymerization of gaseous ethynyltrimethylsilane at atmospheric pressure of He represents a convenient way of efficient chemical vapour deposition of polycarbosilane films. The films are produced at ambient temperature of metals, quartz and glass, and are adhesive to these substrates, which makes this process promising for fabrication of protective coatings on thermally unstable surfaces.